The SST Monosilane-based Polysilicon Process

SST has developed a unique process for the production of high-end polsilicon and monosilane, which works differently, and is easier to run, than the conventional TCS-Siemens process.

In the first step, the hydrochlorination, TCS is produced from metallurgical silicon (mgSi) and feed material (STC, mgSi and H2) in a fluidbed-reactor. In the second step, the catalytic disproportionation, TCS is then converted into monosilane and STC. In the last process step, the MS-CVD Deposition (Monosilane Chemical Vapor Deposition), the monosilane gas is heated, and high-purity polysilicon deposits on heated rods, after which the high-end polysilicon can be harvested. 

The process is easier to run than conventional methods. Because the monosilane-process works only with Si and H2, and not with chlorine, this technology provides for enormous development potential in the crystalline value chain.

The high level of purity enables application of the polysilicon for the solar industry, as well as for all applications in the electronics industry.

 

          Advantages of the Monosilan-Method:

          1. Highest Quality

          2. Best-in-Class Cost

          3. Easy-to-run Process